[3dem] Re: Contamination rates

acheng at scripps.edu acheng at scripps.edu
Thu Nov 13 16:04:45 PST 2008


Hi, Ruben,

  When we made our measurements used in our paper in JSB v.154 (2006)
303-311.  we did the basic measurements on both of our Tecnai F20, and
the results were comparable at 0.1-0.2 nm without film.

  Anchi

Anchi Cheng
NRAMM
The Scripps Research Institute

> ----------------------------------------------------------------------
>
> Message: 1
> Date: Wed, 12 Nov 2008 17:56:56 -0500
> From: "Ruben Diaz-Avalos" <diaz at nysbc.org>
> Subject: [3dem] Contamination rates
> To: 3dem at ncmir.ucsd.edu
> Message-ID: <20081112225656.691940bf at nysbc.org>
> Content-Type: text/plain;	charset="us-ascii"
>
> Hello everyone,
>
> I am quite interested in knowing if people have carried out measurements
> of contamination rates for different microscopes, and what are the results
> of their measurements, to find out how the different instruments fare in
> this test. At the NYSBC we have both JEOL and FEI instruments, and we
> measure significantly different contamination rates between the two
> brands, therefore I would like to know if we are observing a common trend.
>
> By contamination rate in this case, I mean the rate of accumulation of
> water on the grid's surface per hour (in nanometers per hour). A low
> contamination rate obviously is very desirable, since only then a sample
> can be used for a long session of data collection.
>
> Cheers!
>
> Ruben.
>
> ********************************************
>
> Ruben Diaz-Avalos, Ph.D.,
> Technical Director,
> New York Structural Biology Center,
> 89 Convent Ave. at 133rd St.,
> New York, NY 10027
> tel: (212)939-0660 x 529
> cell:(646)300-1453
>
> ********************************************




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